Thomas Schuelke
Professor
Department of Electrical and Computer Engineering, College of Engineering
Engr Rsch Complex, 1449 Engineering Research Ct Room C123
Biography
Thomas Schuelke earned his Ph.D. in Physics from the Technical University Dresden, Germany, in 1996. He worked as a Research and Development Engineer for Charted Semiconductor Manufacturing in Singapore prior to taking over the responsibility for Fraunhofer USA’s Thin Film Coatings Laboratory in 1998. He currently serves as president of Fraunhofer USA. Schuelke’s research addresses thin film coating technologies for industrial applications. A particular focus is on diamond and diamond-like carb
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Ph.D.; Physics; Technical University Dresden, Germany; 1996
M.Sc.; Physics; Technical University Dresden, Germany; 1992
Awards
Top Reviewer Award, Diamond and Related Materials Research Journal (2009)
Featured in “People in Research”, Annual Report of the Fraunhofer Society, Germany (2005)
Research Award, German Academic Exchange Service to perform a joint research project at the Plasma Applications Laboratory (Dr. Ian Brown) at LBNL, Berkeley, CA, USA (1995)
Publications
S. Nicley, S. Zajac, R. Rechenberg, M. Becker, A. Hardy, T. Schuelke, and T.A. Grotjohn, “Fabrication and characterization of a corner architecture Schottky barrier diode structure”, physica status solidi A, 1-8 (2015)
Grotjohn, T., D. T. Tran, M.K. Yaran, S. N. Demlow, T. Schuelke, “Heavy phosphorus doping by epitaxial growth on the (111) diamond surface”, Diamond and Related Materials, 44 (2014)
Muehle, M., M. Becker, T. Schuelke, and J. Asmussen, “Substrate crystal recovery for homoepitaxial diamond”, Diamond and Related Materials 42 (2014).
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